Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Raymond Laurentius Johannes Schrijver0
Albert Johannes Maria Jansen0
Erik Roelof Loopstra0
Jan Jaap Kuit0
Date of Patent
September 9, 2008
Patent Application Number
10766526
Date Filed
January 29, 2004
Patent Primary Examiner
Patent abstract
A lithographic apparatus has a mask table adapted to accommodate a mask in at least two positions so that a mask with a pattern area larger than the exposure field can be imaged by first performing an exposure with the mask in the first position and then performing a second exposure with the mask in the second position.
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