US Patent 7424389 Measuring layer thickness or composition changes
Patent 7424389 was granted and assigned to Eastman Kodak on September, 2008 by the United States Patent and Trademark Office.
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Patent Inventor Names
Michael A. Marcus0
Steven C. Switalski0
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Patent abstract
A method of measuring the thickness or the rate of change of thickness of a layer as the layer is being formed on a substrate, includes illuminating the layer through the substrate with low coherence light that transmits through the layer; collecting a portion of the reflected light from each optical interface of the substrate and layer with a low coherence interferometer; and, calculating the thickness or the rate of change of thickness of the layer according to the obtained interferometric data.
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US Patent 07424389 Measuring layer thickness or composition changes US Patent 7424389 Measuring layer thickness or composition changes
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Patent Number
07424389
Patent Number
7424389
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US Patent 07424389 Measuring layer thickness or composition changes
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Is a
Current assignee
Patent jurisdiction
Patent number
07424389
Date of patent
September 9, 2008
Patent application number
11779570
Date Filed
July 18, 2007
Patent primary examiner
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