Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Koen Jacobus Johannes Maria Zaal0
Frederik Eduard De Jong0
Hermen Folken Pen0
Koen Goorman0
Antonius Johannes De Kort0
Boris Menchtchikov0
Date of Patent
September 16, 2008
Patent Application Number
11223209
Date Filed
September 12, 2005
Patent Primary Examiner
Patent abstract
In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using normal and reversed meanders. The two data sets can then be used to eliminate effects due to wafer cooling.
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