Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Michael Jozef Mathijs Renkens0
Hendricus Johannes Maria Meijer0
Date of Patent
September 16, 2008
0Patent Application Number
116540370
Date Filed
January 17, 2007
0Patent Primary Examiner
Patent abstract
A device manufacturing method includes bringing pressure within a vacuum chamber of a lithographic projection apparatus to a temperature stabilizing pressure range; keeping the pressure within the vacuum chamber within the temperature stabilizing pressure range for a period of time so as to stabilize the temperature in the vacuum chamber; decreasing the pressure within the vacuum chamber to a production pressure range; generating a beam of radiation with a radiation system; patterning the beam of radiation; and projecting the patterned beam of radiation through the vacuum chamber onto a target portion of a layer of radiation-sensitive material on a substrate.
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