US Patent 7428373 Delivery of solid chemical precursors

Systems and methods are provided for delivering solid precursors. In certain embodiments of the present application, a flow monitor, pressure sensor, or temperature sensor is used to measure and regulate the flow of vaporized solid precursor material from a vaporization chamber to a deposition chamber. To avoid condensation of the solid precursor material in the delivery lines, a controller is placed in a feed back loop to make adjustments to the amount of vapor available. Additional embodiments are disclosed and claimed.