Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
October 7, 2008
Patent Application Number
11001669
Date Filed
December 1, 2004
Patent Citations Received
Patent Primary Examiner
Patent abstract
The present invention relates to a system and method for sampling a gas flow to measure one or more contaminants within a semiconductor processing tool. The system includes a portable unit containing one or more dry traps, Tenax traps and, if desired, wet impingers. The unit is coupled to a gas flow in a clean room and the dry traps. Tenax traps and wet impingers measure contaminants contained in the gas supply for a determined sampling interval. When the sampling interval is done, the unit is sent to an analysis facility for processing.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
