Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Paul Graupner0
Erik Roelof Loopstra0
Johannes Catharinus Hubertus Mulkens0
Johannes Jacobus Matheus Baselmans0
Bob Streefkerk0
Date of Patent
October 7, 2008
0Patent Application Number
109613690
Date Filed
October 12, 2004
0Patent Primary Examiner
Patent abstract
An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.
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