Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Johannes Onvlee0
Jacques Cor Johan Van der Donck0
Vadim Yevgenyevich Banine0
Michiel Peter Oderwald0
Arno Jan Bleeker0
Date of Patent
October 7, 2008
0Patent Application Number
114184540
Date Filed
May 5, 2006
0Patent Primary Examiner
Patent abstract
The invention relates to a method and device of inspecting contamination particles on an object comprising a patterned structure. The device includes a radiation system for directing a radiation beam to the object. The object is configured to scatter the beam. The device also includes an optical system arranged to receive scattered radiation from the object, and a filter provided in the optical system. The filter is associated with the patterned structure so as to filter out radiation from the scattered radiation. The device also includes a detector arranged to detect a fraction of radiation that is transmitted by the filter. Accordingly, contamination particles may be detected quickly and accurately.
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