Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
October 7, 2008
Patent Application Number
11236208
Date Filed
September 27, 2005
Patent Primary Examiner
Patent abstract
A method of calculating process conditions for performing optical and process correction (OPC) or other resolution enhancement techniques on a layout design. Process conditions are estimated on a layout database on a substantially uniform grid. Contour curves are created from the estimated process conditions. The contour curves are then compared against the features in the layout to determine edge placement errors. From the edge placement errors, OPC or other corrections for the features can be made.
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