Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Hideo Mizutani0
Nobutaka Magome0
Date of Patent
October 14, 2008
0Patent Application Number
113453920
Date Filed
February 2, 2006
0Patent Primary Examiner
Patent abstract
An exposure apparatus performs an exposure of a substrate by filling at least a portion of the space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate via the projection optical system and the liquid. The apparatus includes a bubble detector that detects air bubble or bubbles in the liquid between the projection optical system and the substrate. Consequently, the exposure apparatus is capable of suppressing deterioration of a pattern image caused by bubbles in the liquid when an exposure is carried out while filling the space between the projection optical system and the substrate with the liquid.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
