Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
November 4, 2008
Patent Application Number
11636693
Date Filed
December 8, 2006
Patent Primary Examiner
Patent abstract
Etching the surface (activating the surface) of a halogenated polymer component with an electron beam generates a set of free radical sites in polymeric chains of the surface that sustain for at least 4 hours in an inert environment. The inert environment is provided by a noble gas, nitrogen, a static free space, and/or a vacuum. Items such as dynamic seals, static seals, gaskets, pump diaphragms, hoses, and o-rings all benefit from precursors made according to the technique.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
