Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Petrus Marinus Christianus Maria Van Den Biggelaar0
Date of Patent
November 4, 2008
0Patent Application Number
113485180
Date Filed
February 7, 2006
0Patent Primary Examiner
Patent abstract
A lithographic apparatus includes a first control system to control a first physical quantity in the lithographic apparatus. A parameter in the first control system is dependent on a value of a further physical quantity in the lithographic apparatus. The parameter may be included in a feedforward path. An input of the feedforward path may be connected to a second control system, the second control system to control a second physical quantity in the lithographic apparatus. The feedforward path may provide a feedforward signal to the first control system in dependency on a signal in the second control system. The further physical quantity may include the second physical quantity.
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