US Patent 7449265 Scatterometry target for determining CD and overlay

Patent 7449265 was granted and assigned to Tokyo Electron on November, 2008 by the United States Patent and Trademark Office.

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Patent

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Current Assignee

Tokyo Electron

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

7449265

Date of Patent

November 11, 2008

Patent Application Number

11943286

Date Filed

November 20, 2007

Patent Primary Examiner

‌

Christopher G Young

Patent abstract

The invention can provide a method of processing a wafer using segmented multi-dimensional targets that can be used in Double-Patterning (D-P) procedures.

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