Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Wilhelm Ulrich0
David R. Shafer0
Date of Patent
November 11, 2008
0Patent Application Number
111750920
Date Filed
July 5, 2005
0Patent Primary Examiner
Patent abstract
An optical projection lens system for microlithography includes in the direction of propagating radiation: a first lens group having positive refractive power, a second lens group having negative refractive power and a waist (constriction) with a minimum diameter of the propagating radiation, and a further lens arrangement with positive refractive power, which follows the second lens group. At least one lens of the projection lens system which is arranged in front of the waist includes an aspherical surface.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
