Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Ryuichiro Taniguchi0
Tomoyuki Yuba0
Masao Tomikawa0
Date of Patent
November 25, 2008
0Patent Application Number
112742220
Date Filed
November 16, 2005
0Patent Primary Examiner
Patent abstract
This invention relates to a positive photosensitive resin composition allowing development with an alkaline aqueous solution and excellent in resolution, photosensitivity and pattern form even if the film formed from the resin is thick.
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