Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Koichi Wago0
Date of Patent
December 2, 2008
0Patent Application Number
106652750
Date Filed
September 22, 2003
0Patent Primary Examiner
Patent abstract
A rotary apertured interferometric lithography (RAIL) system that includes interferometric lithography tools, a mask with a slit preferably with an arc shape, and a rotating stage is disclosed. The RAIL system could create a servo pattern of a recording-head trajectory of a hard disk drive in a master for magnetic-contact printing. The master can could be used to form arrays of sub-micron sized magnetic elements on a magnetic disk media for high-density magnetic recording applications.
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