Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Maurits Van Der Schaar0
Richard Johannes Franciscus Van Haren0
Sami Musa0
Date of Patent
December 2, 2008
0Patent Application Number
113894940
Date Filed
March 27, 2006
0Patent Citations Received
Patent Primary Examiner
Patent abstract
An alignment tool for a lithographic apparatus illuminates an alignment mark on a substrate with an alignment beam and measures the reflected spectrum. The reflected spectrum is compared with a reference mark to determine any misalignment. A blazed sub-wavelength grating is used to deflect the sub-beams created by diffracting the alignment beam from the alignment mark onto the reference mark.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
