US Patent 7462728 Diepoxide derivatives of N,N*-disubstituted disulfonamides

The present invention relates to novel diepoxides having the formulas I. and II.R*N(A)SO2RSO2N(A)R*  IR*SO2N(A)RN(A)SO2R*  IIwhere A=2,3-epoxypropyl, R* is a monovalent hydrocarbon alkyl aryl, aryl-alkyl, alkyl-aryl radical of 1-20 carbon atoms or a monovalent inertly substituted hydrocarbon aryl, alkyl, alkyl-aryl or aryl-alkyl radical of 1-20 carbons atoms and R is a divalent hydrocarbon arylene, alkylene, alkylene-aryl, arylene-alkyl radical or combinations thereof of 2-20 carbon atoms or an inertly substituted divalent hydrocarbon alkylene, arylene, arylene-alkyl, or alkylene-aryl radical or combinations thereof of 2-20 carbon atoms. The epoxides are useful in preparing novel epoxide resins.