US Patent 7463333 Multi-exposure lithography system providing increased overlay accuracy
Patent 7463333 was granted and assigned to Samsung on December, 2008 by the United States Patent and Trademark Office.
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Multi-exposure lithography systems are provided for improved overlay accuracy. In one aspect, a method for multi-exposure lithography operates by determining overlay parameters corresponding to each of a plurality of sub-layouts, inputting the overlay parameters into an exposure system, exposing each sub-layout to photoresist on a wafer by using the exposure system, wherein prior to the exposure process for a given sub-layout, a correction process is performed for the sub-layout using a corresponding overlay parameter to correct an overlay of the sub-layout, and developing the exposed photoresist after exposing all of the sub-layouts.
US Patent 07463333 Multi-exposure lithography system providing increased overlay accuracy US Patent 7463333 Multi-exposure lithography system providing increased overlay accuracy
US Patent 07463333 Multi-exposure lithography system providing increased overlay accuracy
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