US Patent 7465424 Sputtering target material
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Patent abstract
Provided is a sputtering target material which has a high reflectance and which is excellent in a sulfurization resistance, comprising an Ag alloy prepared by alloying Ag with a specific small amount of the metal component (A) selected from In, Sn and Zn, a specific small amount of the metal component (B) selected from Au, Pd and Pt and, if necessary, a small amount of Cu.
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US Patent 07465424 Sputtering target material US Patent 7465424 Sputtering target material
Infobox
Patent Number
0746542400
Patent Number
746542400
Edits on 29 Mar, 2023
Golden AI
Infobox
Is a
Patent Jurisdiction
Patent Number
074654240
Date of Patent
December 16, 2008
0Patent Application Number
104704140
Date Filed
March 15, 2002
0Official Website
Patent Primary Examiner
Edits on 23 Sep, 2022
Golden AI
Infobox
Is a
Patent Jurisdiction
Patent Number
074654240
Date of Patent
December 16, 2008
0Patent Application Number
104704140
Date Filed
March 15, 2002
0Official Website
Patent Primary Examiner
Edits on 14 Jun, 2022
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US Patent 07465424 Sputtering target material
Infobox
Is a
Patent jurisdiction
Patent number
07465424
Date of patent
December 16, 2008
Patent application number
10470414
Date Filed
March 15, 2002
Patent primary examiner
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