Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Geun Su Lee0
Cheol Kyu Bok0
Date of Patent
December 23, 2008
0Patent Application Number
116501410
Date Filed
January 4, 2007
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A photoresist cleaning solution and method for forming photoresist patterns using the same. More specifically, disclosed are a photoresist cleaning solution comprising H2O and an ionic surfactant represented by Formula 1, and a method for forming a photoresist pattern using the same. By spraying the cleaning solution of the present invention over photoresist film before and/or after exposing step, pattern formation in an undesired region caused by ghost images can be removed.
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