Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yoshihide Senzaki0
Seung Gyun Park0
Date of Patent
December 30, 2008
0Patent Application Number
108297810
Date Filed
April 21, 2004
0Patent Primary Examiner
Patent abstract
The present invention provides systems and methods for mixing precursors such that a mixture of precursors are present together in a chamber during a single pulse step in an atomic layer deposition (ALD) process to form a multi-component film. The precursors are comprised of at least one different chemical component, and such different components will form a mono-layer to produce a multi-component film. In a further aspect of the present invention, a dielectric film having a composition gradient is provided.
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