Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Masayuki Endo0
Masaru Sasago0
Date of Patent
December 30, 2008
Patent Application Number
11203161
Date Filed
August 15, 2005
Patent Primary Examiner
Patent abstract
An exposure system includes an exposure section provided within a chamber for irradiating a resist film formed on a wafer with exposing light through a mask with an immersion liquid provided on the resist film. It further includes a drying section for drying the surface of the resist film after the irradiation.
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