Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Trevan Landin0
Paul Brabant0
Matthias Bauer0
Date of Patent
January 20, 2009
0Patent Application Number
118673180
Date Filed
October 4, 2007
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A method comprises, in a reaction chamber, depositing a seed layer of germanium over a silicon-containing surface at a first temperature. The seed layer has a thickness between about one monolayer and about 1000 Å. The method further comprises, after depositing the seed layer, increasing the temperature of the reaction chamber while continuing to deposit germanium. The method further comprises holding the reaction chamber in a second temperature range while continuing to deposit germanium. The second temperature range is greater than the first temperature.
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