Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Gregory John McAvoy0
Kia Silverbrook0
Darrell LaRue McReynolds0
Date of Patent
January 27, 2009
Patent Application Number
11198235
Date Filed
August 8, 2005
Patent Primary Examiner
Patent abstract
A method suitable for etching hydrophilic trenches into a substrate, such as silicon, is provided. The method comprises etching and sidewall passivation processes for achieving anisotropy. Sidewalls of the etched trench are made hydrophilic during the etch by virtue of a hydrophilizing dopant in a passivating gas plasma. The method is useful for etching ink supply channels in inkjet printheads.
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