Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
February 24, 2009
Patent Application Number
10393735
Date Filed
March 21, 2003
Patent Primary Examiner
Patent abstract
Methods and apparatus for determining the extent of etching in material by locating a detector element adjacent to a portion of the material that is to be etched. The width of the element varies. The resistance of the element is measured upon etching the portion.
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