Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chin-Hsiang Lin0
Kuei Shun Chen0
David Ding-Chung Lu0
Date of Patent
March 10, 2009
0Patent Application Number
112166580
Date Filed
August 31, 2005
0Patent Primary Examiner
Patent abstract
A method for producing a pattern on a substrate includes providing at least one exposure of the pattern onto a layer of the substrate by a higher-precision lithography mechanism and providing at least one exposure of the pattern onto a layer of the substrate by a lower-precision lithography mechanism. The exposures can be done in either order, and additional exposures can be included. The higher-precision lithography mechanism can be immersion lithography and the lower-precision lithography mechanism can be dry lithography.
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