Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Noriaki Oda0
Toshiyuki Takewaki0
Date of Patent
March 24, 2009
0Patent Application Number
118443810
Date Filed
August 24, 2007
0Patent Primary Examiner
Patent abstract
There is provided a solution to the problem of the poor adhesion in the pad portion while inhibiting the dishing in the pad portion. An SiON film, which covers insulating areas and has an opening above Cu pad areas, is formed, and a barrier metal film is formed in the opening of the SiON film. Such constitution provides the structure, in which the upper portion of the interfaces between the Cu pad areas and the insulating areas are covered by the SiON film.
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