US Patent 7511797 Lithography system, control system and device manufacturing method
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Patent Inventor Names
Franciscus Van De Mast0
Johan Christiaan Gerard Hoefnagels0
Johannes Onvlee0
Reinder Teun Plug0
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Patent abstract
A lithography system in which a performance criterion of the lithography system is predicted, based on one or more operating conditions of the lithography system, and compared to measurements of that performance criterion. The lithography system may determine from a difference between the measured and predicted performance criterion which, if any, sub-system of the lithography system is not performing as expected.
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US Patent 07511797 Lithography system, control system and device manufacturing method US Patent 7511797 Lithography system, control system and device manufacturing method
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Patent Number
07511797
Patent Number
7511797
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US Patent 07511797 Lithography system, control system and device manufacturing method
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Patent jurisdiction
Patent number
07511797
Date of patent
March 31, 2009
Patent application number
12068288
Date Filed
February 5, 2008
Patent primary examiner
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