US Patent 7514203 Positive photoresist composition

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Edits on 17 Sep, 2023

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edited on 17 Sep, 2023

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Patent Inventor Names

Bong-Seok Moon0

Hyo-Jeong Kim0

Jin-Gon Kim0

Kwon-Yil Yoo0

Mi-Kyeong Jeong0

Min-Ji Kim0

Nak-Chil Jung0

Seon-Ho Kim0

Yang-Hyun Yoo0

Edits on 15 Sep, 2023

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edited on 15 Sep, 2023

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Patent abstract

Disclosed is a positive photoresist composition used for a liquid crystal display. The positive photoresist composition of the present invention includes 3 to 50% by weight of binder resin having a certain structure, 2 to 40% by weight of a photoactive compound and 10 to 94% by weight of an organic solvent. The positive photoresist composition according to the present invention may be useful to form a pattern for an organic insulator of a liquid crystal display, metal patterning, a bump, hole drilling and UV overcoat since it has good basic physical properties such as UV transmittance, film retention, pattern stability, chemical resistance and so on, as well as an excellent heat resistance.

Edits on 21 Jul, 2023

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edited on 21 Jul, 2023

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Official Website

https://pdfpiw.uspto.gov/.piw?Docid=07514203

Edits on 24 May, 2023

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