Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Mitsuru Okigawa0
Seiji Samukawa0
Tadashi Shinmura0
Date of Patent
April 21, 2009
Patent Application Number
10501351
Date Filed
February 3, 2003
Patent Citations Received
0
Patent Primary Examiner
Patent abstract
An on-wafer monitoring system is placed at a position of a substrate to be treated in a plasma treatment device. The on-wafer monitoring system includes various sensors, a data I/O unit for optically inputting/outputting data to/from outside, and an internal power source unit for supplying power to them. The on-wafer data I/O unit is connected to a laser diode (LD) and a photo diode (PD) which are optical I/O units installed outside. The data I/O unit receives an instruction from outside and transmits monitored data to outside. Sensors arranged on the substrate are an ion energy analyzer, a VUV photon detector, and a radical ion species emission spectrophotometer.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
