Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Atsushi Tamura0
Date of Patent
April 21, 2009
Patent Application Number
11289457
Date Filed
November 30, 2005
Patent Primary Examiner
Patent abstract
A remover composition used for cleaning of a semiconductor substrate or semiconductor element, wherein (1) the remover composition contains 65% by weight or more of water; (2) the remover composition has a pH at 20° C. of 2 or more and 6 or less; and (3) the remover composition contains (I) at least one member selected from the group consisting of a saccharide, an amino acid compound, an organic acid salt and an inorganic acid salt, and 0.01 to 1% by weight of ammonium hexafluorosilicate, or (II) an organic phosphonic acid and a fluorine-containing compound. The remover composition of the present invention can be suitably used for manufacturing high-quality electronic parts such as LCD, memory, and CPU.
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