Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
April 21, 2009
Patent Application Number
11012492
Date Filed
December 16, 2004
Patent Primary Examiner
Patent abstract
Disclosed is a method of producing a pattern for a semiconductor device, comprising extracting part of a pattern layout, perturbing a pattern included in the part of the pattern layout to generate a perturbation pattern, correcting the perturbation pattern, predicting a first pattern, to be formed on a wafer, from the corrected perturbation pattern, acquiring a first difference between the perturbation pattern and the first pattern, and storing information concerning the perturbation pattern including information concerning the first difference.
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