Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
April 28, 2009
Patent Application Number
11686834
Date Filed
March 15, 2007
Patent Primary Examiner
Patent abstract
A method of forming a metal pattern comprising forming a metal film having a lower layer made of a metal and an upper layer made of a metal different from the metal of the lower layer, forming a resist film having a predetermined pattern on the upper layer, and patterning the metal film by etching the metal film using the resist film as a mask. Here, patterning the metal film comprises etching the upper layer, immersing the resist film and the upper layer in a pretreatment liquid containing a nonionic surfactant after the first etching process, and etching the lower layer after the immersing process.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
