US Patent 7524617 Low-temperature curable photosensitive compositions
Patent 7524617 was granted and assigned to E.I. Du Pont De Nemours And Company on April, 2009 by the United States Patent and Trademark Office.
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Patent abstract
The invention relates to low-temperature curable photosensitive compositions containing a polyamic acid, which compositions are developable in aqueous alkaline solutions and are curable, at a temperature of at least 160° C. and up to 200° C., to low modulus polyimides suitable for use in electronic circuitry applications, and which are particularly suitable for use in flexible circuit applications where low curl, low temperature curing, and good adhesion is a significant advantage.
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US Patent 07524617 Low-temperature curable photosensitive compositions US Patent 7524617 Low-temperature curable photosensitive compositions
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Patent Number
0752461700
Patent Number
752461700
Edits on 28 Apr, 2023
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
075246170
Date of Patent
April 28, 2009
0Patent Application Number
109977010
Date Filed
November 23, 2004
0Official Website
Patent Primary Examiner
Edits on 26 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
075246170
Date of Patent
April 28, 2009
0Patent Application Number
109977010
Date Filed
November 23, 2004
0Official Website
Patent Primary Examiner
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US Patent 07524617 Low-temperature curable photosensitive compositions
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07524617
Date of patent
April 28, 2009
Patent application number
10997701
Date Filed
November 23, 2004
Patent primary examiner
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