Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Markus Josef Hauf0
Bastiaan Stephanus Hendricus Jansen0
Erik Roelof Loopstra0
Marius Ravensbergen0
Date of Patent
April 28, 2009
0Patent Application Number
115936480
Date Filed
November 7, 2006
0Patent Primary Examiner
Patent abstract
A lithographic apparatus is disclosed that includes an optical arrangement having an array of optical elements arranged in a plane perpendicular to the radiation beam. Each optical element comprises an electrical heating device to change an optical path length of the radiation beam. By selectively actuating the electrical heating devices, a position dependent change in optical path length can be achieved in order to correct for irradiation-induced optical path length errors.
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