US Patent 7527016 Plasma processing apparatus
Patent 7527016 was granted and assigned to Tokyo Electron on May, 2009 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
July 10, 2003
0
Date of Patent
May 5, 2009
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Patent Application Number
10615915
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Patent Citations Received
Patent Inventor Names
Tsutomu Higashiura
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Yohei Yamazawa
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Akitaka Shimizu
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Asao Yamashita
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Chishio Koshimizu
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Dongsheng Zhang
0
Fumihiko Higuchi
0
Manabu Iwata
0
Michiko Nakaya
0
Nobuhiro Iwama
0
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Patent Jurisdiction
Patent Number
Patent Primary Examiner
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