Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Mikio Ogata0
Ryoichi Aogaki0
Eiko Ito0
Date of Patent
May 5, 2009
0Patent Application Number
105657550
Date Filed
November 4, 2003
0Patent Primary Examiner
Patent abstract
Means for enabling plating on sites of complex configuration, etching for fine complex pattern, etc. through reduction of the viscosity resistance brought about by walls of fine liquid channel of microreactor. In particular, a microreactor comprising a liquid inlet, a fine liquid channel and a liquid discharge zone characterized in that the liquid channel is formed of a magnetic barrier of band ferromagnet so that a magnetic liquid introduced through the inlet undergoes at least one operation of chemical reaction, mixing, extraction and absorption in the liquid channel. Further, there is provided means for plating or etching performed by causing a plating solution or an etching solution to flow through the liquid channel.
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