US Patent 7527920 Active hardmask for lithographic patterning
Patent 7527920 was granted and assigned to Intel on May, 2009 by the United States Patent and Trademark Office.
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Patent abstract
In an implementation, energy reaching the lower surface of a photoresist may be redirected back into the photoresist material. This may be done by, for example, reflecting and/or fluorescing the energy from a hardmask provided on the wafer surface back into the photoresist.
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US Patent 07527920 Active hardmask for lithographic patterning US Patent 7527920 Active hardmask for lithographic patterning
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Patent Number
0752792000
Patent Number
752792000
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Official Website
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
075279200
Date of Patent
May 5, 2009
0Patent Application Number
112935940
Date Filed
December 2, 2005
0Official Website
Patent Primary Examiner
Edits on 26 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
075279200
Date of Patent
May 5, 2009
0Patent Application Number
112935940
Date Filed
December 2, 2005
0Official Website
Patent Primary Examiner
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US Patent 07527920 Active hardmask for lithographic patterning
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07527920
Date of patent
May 5, 2009
Patent application number
11293594
Date Filed
December 2, 2005
Patent primary examiner
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