Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
May 5, 2009
Patent Application Number
11341399
Date Filed
January 26, 2006
Patent Primary Examiner
Patent abstract
A material of a mirror layer is formed within a trench and a via hole. The trench is formed in a dielectric layer over a substrate. The via hole is formed within the trench. The material within the trench is the mirror layer. The material within the via hole is a via plug. The mirror layer is continuous with the via plug.
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