US Patent 7528937 Dual-sided substrate measurement apparatus and methods
Patent 7528937 was granted and assigned to Ultratech on May, 2009 by the United States Patent and Trademark Office.
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Patent abstract
An apparatus for measuring the relative positions of frontside and backside alignment marks located on opposite sides of a substrate is disclosed. The apparatus includes upper and lower optical systems that allow for simultaneous imaging of frontside and backside alignment marks. The frontside and backside alignment mark images are processed to determine the relative position of the marks, as a measurement of the alignment and/or overlay performance of the tool that formed the marks on the substrate.
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US Patent 07528937 Dual-sided substrate measurement apparatus and methods US Patent 7528937 Dual-sided substrate measurement apparatus and methods
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Patent Number
0752893700
Patent Number
752893700
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
075289370
Date of Patent
May 5, 2009
0Patent Application Number
102138680
Date Filed
August 5, 2002
0Official Website
Patent Primary Examiner
Edits on 24 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
075289370
Date of Patent
May 5, 2009
0Patent Application Number
102138680
Date Filed
August 5, 2002
0Official Website
Patent Primary Examiner
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US Patent 07528937 Dual-sided substrate measurement apparatus and methods
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07528937
Date of patent
May 5, 2009
Patent application number
10213868
Date Filed
August 5, 2002
Patent primary examiner
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