Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Kiichi Meguro0
Takahiro Imai0
Yoshiki Nishibayashi0
Yutaka Ando0
Date of Patent
May 19, 2009
Patent Application Number
10774417
Date Filed
February 10, 2004
Patent Primary Examiner
Patent abstract
The method of making a diamond product in accordance with the present invention comprises the steps of forming a diamond substrate (50) with a mask layer (52), and etching the diamond substrate (50) formed with the mask layer (52) with a plasma of a mixed gas composed of a gas containing an oxygen atom and a gas containing a fluorine atom, whereas the fluorine atom concentration is within the range of 0.04% to 6% with respect to the total number of atoms in the mixed gas.
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