US Patent 7534544 Method of separating an exposed thermal transfer assemblage

In a method of using a donor element in a radiation-induced thermal transfer process, an assemblage is provided that includes a donor element and a receiver element, wherein the donor element has a support layer and a transfer layer having one side adjacent the support layer and the other side adjacent the receiver element. After image-wise exposing the assemblage to radiation whereby a portion of the transfer layer is transferred to the receiver element, relative movement between the support layer and the receiver element is provided before separating the donor element from the receiver element. Advantages include improved edge straightness, image width predictability, improved thermal mass transfer, and improved color filters.