US Patent 7534549 Photoresist polymer, and photoresist composition
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Patent abstract
A photoresist polymer comprising a fluorine component, a photoresist composition containing the photoresist polymer and an organic solvent to reduce surface tension, and a method for manufacturing a semiconductor device using the same by forming a photoresist film uniformly on the whole surface of an underlying layer pattern to allow a subsequent ion-implanting process to be performed stably.
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US Patent 07534549 Photoresist polymer, and photoresist composition US Patent 7534549 Photoresist polymer, and photoresist composition
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Patent Number
0753454900
Patent Number
753454900
Edits on 6 Apr, 2023
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Is a
Patent Jurisdiction
Patent Number
075345490
Date of Patent
May 19, 2009
0Patent Application Number
113121060
Date Filed
December 20, 2005
0Official Website
Patent Primary Examiner
Edits on 27 Sep, 2022
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Infobox
Is a
Patent Jurisdiction
Patent Number
075345490
Date of Patent
May 19, 2009
0Patent Application Number
113121060
Date Filed
December 20, 2005
0Official Website
Patent Primary Examiner
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US Patent 07534549 Photoresist polymer, and photoresist composition
Infobox
Is a
Patent jurisdiction
Patent number
07534549
Date of patent
May 19, 2009
Patent application number
11312106
Date Filed
December 20, 2005
Patent primary examiner
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