Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Ralph R. Dammel0
Francis M. Houlihan0
M. Dalil Rahman0
Munirathna Padmanaban0
Andrew R. Romano0
Date of Patent
May 26, 2009
Patent Application Number
10994745
Date Filed
November 22, 2004
Patent Primary Examiner
Patent abstract
The present invention relates to a novel chemically amplified photoresist, which is sensitive to wavelengths between 300 nm and 100 nm, and comprises a) a novel polymer comprising a sulfone group pendant from a polymer backbone that is insoluble in an aqueous alkaline solution and comprises at least one acidic moiety protected with acid labile group, and b) a compound capable of producing an acid upon irradiation. The invention also relates to a process of imaging the novel positive photoresist composition.
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