Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
June 16, 2009
Patent Application Number
11127280
Date Filed
May 11, 2005
Patent Primary Examiner
Patent abstract
An apparatus and associated method for reducing thermal damage on a specimen during an inspection which includes a radiation source for supplying a beam of radiation, and a means for adjusting a first energy level of the beam of radiation to a second energy level as the beam of radiation is variably positioned from a first location on the surface of the wafer to a second location on the surface of the wafer.
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