Patent 7551052 was granted and assigned to Industrial Technology Research Institute on June, 2009 by the United States Patent and Trademark Office.
Embedded inductor devices and fabrication methods thereof. An embedded inductor device includes a substrate, a conductive coil disposed on the substrate, and a patterned high-permeability (μr>1) magnetic layer on the substrate. The patterned high-permeability (μr>1) magnetic layer physically contacts the conductive coil. The conductive coil and the patterned high-permeability (μr>1) magnetic layer are intersected and substantially perpendicular to each other.