Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
July 7, 2009
Patent Application Number
11633995
Date Filed
December 5, 2006
Patent Primary Examiner
Patent abstract
A plasma is produced in a treatment space (58) by diffusing a plasma gas at atmospheric pressure and subjecting it to an electric field created by two metallic electrodes (54,56) separated by a dielectric material (64), and a precursor material is introduced into the treatment space to coat a substrate film or web (14) by vapor deposition or atomized spraying at atmospheric pressure. The deposited precursor exposed to an electromagnetic field (AC, DC, or plasma) and then it is cured by electron-beam, infrared-light, visible-light, or ultraviolet-light radiation, as most appropriate for the particular material being deposited. Additional plasma post-treatment may be used to enhance the properties of the resulting coated products.
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