Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Takuo Oowada0
Kaoru Ikegami0
Norio Ishikawa0
Date of Patent
July 21, 2009
0Patent Application Number
111681420
Date Filed
June 28, 2005
0Patent Primary Examiner
Patent abstract
A composition for removing a photoresist residue and a polymer residue remaining on a semiconductor substrate after dry etching and after ashing is provided, the composition containing at least one type of fluorine compound, at least one type of organic acid, at least one type of organic amine, and water, the composition having a pH of 4 to 7, and the total content of components other than water being 0.3 to 30 mass % of the entire composition.
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