Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jae-Won Han0
Date of Patent
August 4, 2009
0Patent Application Number
118966630
Date Filed
September 5, 2007
0Patent Primary Examiner
Patent abstract
A method for manufacturing an inductor using a system-in-package (SIP) includes forming a first penetration electrode in a silicon substrate; depositing an insulating film on a first surface of the silicon substrate, and patterning the insulating film to form an inductor hole and a second penetration hole aligned with the first penetration hole; forming an inductor in the inductor hole and a second penetration electrode in the second penetration hole; and depositing a protective film on the insulating film and performing a back grind process such that the first penetration electrode is exposed from a second surface of the silicon substrate, the second surface being opposed to the first surface.
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